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发帖数: 2207 | 1 Cleaning is not an easy thing for those working at the nanoscale and in the
semiconductor field. In fact, many simple approaches to cleaning will result
in a "dirty" surface for our needs. Alas, others have reached and overcome
this hurdle in many ways:
RCA Clean
A well-known and established technique, RCA clean consists of two to three steps. This was developed by Kern in 1965.
These chemicals are dangerous! Be careful, wear full safety gear, do not store it in a sealed container, and check wit |
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