m*****r
发帖数: 289 | 1 Is there any good way to do the first lithography on the whole 2 inch III-V
wafer?
The way we are doing is to cut a small piece from the primary flat and align
with this fresh edge but we lost a small portion. Any better way? Thanks a
lot! |
s*****3
发帖数: 1673 | 2 这个好像是必须这么做的，我没有听过有啥其他的好办法。
epi growth的时候有个spec, 一般在+/- 0.5 degree? 你做photo的时候也有误差吧。
两个一叠加就蛮大的了 |
w********o
发帖数: 10088 | 3 为什么第一个litho要这样align？要care orientation？
你不能用flat edge？stepper也可以把holder改一下，按flat edge align啊。contact
mask就更好办了
V
align
a
【在 m*****r 的大作中提到】
: Is there any good way to do the first lithography on the whole 2 inch III-V
: wafer?
: The way we are doing is to cut a small piece from the primary flat and align
: with this fresh edge but we lost a small portion. Any better way? Thanks a
: lot!
|
m*****r
发帖数: 289 | 4 Thanks Soul163. The original flat edge may not exactly line with crystal
orientation besides it is not sharp enough. |
